Alejandro Matamala Ortiz to Showcase Design-Driven AI Insights at TechCrunch Disrupt 2025

Alejandro Matamala Ortiz, co-founder and chief design officer of Runway, is set to take the stage at TechCrunch Disrupt 2025. This prominent event will occur from October 27 to 29 in San Francisco, attracting over 10,000 leaders in the startup and venture capital sectors. At Disrupt 2025, Ortiz will present insights on how design principles…

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Alejandro Matamala Ortiz to Showcase Design-Driven AI Insights at TechCrunch Disrupt 2025

Alejandro Matamala Ortiz, co-founder and chief design officer of Runway, is set to take the stage at TechCrunch Disrupt 2025. This prominent event will occur from October 27 to 29 in San Francisco, attracting over 10,000 leaders in the startup and venture capital sectors.

At Disrupt 2025, Ortiz will present insights on how design principles can shape the next generation of generative AI tools. His keynote will highlight the need for design-first approaches in developing AI interactions that are intuitive and friendly for all artists. The creative landscape is shifting more rapidly than ever thanks to technology. Ortiz’s point of view aims to expand the definition of creativity in this age of machines.

Runway has quickly become a household name for its revolutionary generative AI software—software that’s democratizing the tools of creation and disrupting industries from film to marketing. Ortiz leads the company’s vision for accessible and cutting-edge creative tools, which are shaping how content is imagined and produced globally. His team is crazy enough to believe that you can empower creatives to do the impossible when combining AI with thoughtful design principles.

Prior to co-founding Runway, Ortiz was a research resident at New York University. While he was there, he worked at the intersection of artificial intelligence and creativity. That foundational experience has influenced and shaped Justus’s work at Runway in profound ways. There, he’s actively exploring how to increase user engagement with AI technologies through design.

These stages provide a ripe setting for stimulating conversations exploring the convergence of design and machine learning. His presence on one of these stages highlights the significance of Ortiz’s work today within this fast-paced field.

As the industry looks towards a future where AI plays a central role in creative processes, Ortiz’s insights will be invaluable. His passion for creating artist-friendly tools makes Runway’s approach an ideal segue into the intersection of design and generative AI.